Handbook of Thin Film Deposition

Klappentext

Handbook of Thin Film Deposition, Fifth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro-properties, ferroelectric films, LED research, and materials for memory applications and other thin film applications.

Of particular note in this new edition is the coverage of `reduction to practice, a phase where the idea for a technology transition from a concept to actual implementation. This section includes chapters that review the most relevant methods to fabricate thin films towards practical applications. The book also discusses the latest applications of various thin film deposition technologies.

Handbook of Thin Film Deposition, 5**th Edition is suitable for materials scientists, engineers, and managers working in academia or semiconductor related R&D.

Inhalt

Part I Introduction

1. Challenges and Future Directions in Nanotechnology

Part II Thin Film Reduction to Practice

2. Limits of gate dielectric Scaling
3. Process Technology for Cu BEOL
4. Integration considerations for the BEOL
5. Sputter Processing 6 Thin film processing for the FEOL
6. Epitaxial Thin film growth 8 CVD technology and Processes
7. Chemical Mechanical Polishing
8. Solution deposition
9. ALD Fundamentals and Challenges

Part III Applications and Limitations

12. Limits to CMOS Scaling
13. Reliability Issues to scaling
14. Thermal engineering at the limits of the CMOS era
15. Optical Thin Films /Optoelectronics
16. Thin film Applications in Semiconductor Logic and memory devices
17. Thin Film applications in Sensors and / or MEMS

Part IV 18 Summary