Materials Science of Thin Films

Auteur
Dr. Kubart's research is focused on synthesis of materials by magnetron sputtering. He is primarily interested in the physics of reactive sputtering, processes taking place at the surfaces and ion surface interaction especially in HiPIMS. Part of his work also includes synthesis of various thin films, especially oxides for electronics and optics, and sulfides for photovoltaics. Kostas Sarakinos holds a Ph.D. degree in Physics from RWTH Aachen University, Germany (2008) and a Docent degree in Materials Physics from Linköping University, Sweden (2012). His research interests include dynamics and atomistic mechanisms during initial thin film formation stages, thin film growth simulations, thin film microstructural and texture evolution, synthesis of optical, magnetic and photocatalytic thin films, and highly ionized and pulsed physical vapor deposition processes.Professor Grégory Abadias is responsible for the 'Thin Film Growth' activities at the Pprime Institute at the University of Poitiers and has a strong experience with TMN, especially ternary and quaternary coatings. He is the coordinator of the MC2 project,Professor Panos Patsalasis specializes in thin film deposition of metals, nitrides and oxides by dc, pulsed dc and rf sputtering, Ion beam and evaporation techniques. He is experienced on X-ray Reflectivity and Diffraction techniques, modelling and simulation of deposition processes.Professor Daniel Gall holds an associate professor position in the Materials Science and Engineering Department at the Rensselaer Polytechnic Institute. He received his Diploma from the University of Basel, Switzerland, in 1994, and his Ph.D. from the University of Illinois at Urbana-Champaign in 2000. Prof. Gall has been a Visiting Scientist at the Frederick Seitz Materials Research Laboratory, Illinois, has served as Assistant Editor and Editorial Board Member for Thin Solid Films, and as Associate Editor for the Journal of Vacuum Science and Technology A. He is the chair-elect of the AVS Advanced Surface Engineering Division and serves as session, symposium, and program chair and as proceedings editor for the International Conference for Metallurgical Coatings and Thin Films and the AVS International Symposium. Prof. Gall's research focuses on the development of an atomistic understanding for thin film growth, with particular interest in transition-metal nitride coatings, ion-surface interactions, and glancing angle deposition. He has pioneered a multiple length-scale approach to explain texture evolution in hard-coatings, has shown how low-energy ion-irradiation can be employed to control surface diffusion processes and resulting microstructures, and has developed a variety of uniquely shaped nanostructure architectures by exploiting atomic shadowing effects during physical vapor deposition. His research on novel transition-metal nitrides was identified as one of the 100 most important scientific discoveries during the past two and a half decades, supported by the US Department of Energy's Office of Science”. He also won the 2006 Alfred H. Geisler Memorial Award for Outstanding Contributions in Education and Thin Film Growth Research,” the Faculty Early Career Development (CAREER) Award from the National Science Foundation, the 2007 Outstanding Research Award from the Rensselaer School of Engineering, the 2008 Early Career Award for Excellence in Educat

Texte du rabat

Since 1992, when Ohring's Materials Science of Thin Films: Deposition and Structure was published as the first true textbook on thin films, the field has expanded tremendously, especially with regard to technological applications. Intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films as well as scientists and engineers who are entering the field or require an overview of thin films, the book provides the most comprehensive coverage of materials science and technology related to thin films and coatings of any book. The 3rd edition brings the book up-to-date with the most important advances made since the publication of the previous edition. All chapters have been fully revised and include new illustrations, examples and exercises.

Contenu

1. Introduction to Thin Films
   
   2. Vacuum Science and Technology
   3. Thin-Film Evaporation Processes
   4. Discharges, Plasmas, and Ion-Surface Interactions
   5. Plasma and Ion Beam Processing of Thin Films
   6. Chemical Vapor Deposition
   7. Substrate Surfaces and Thin-Film Nucleation
   8. Epitaxy
   9. Film Structure
   10. Characterization of Thin Films and Surfaces
   11. Interdiffusion, Reactions, and Transformations in Thin Films
   12. Mechanical Properties of Thin Films