Film Deposition by Plasma Techniques

Plasma deposition techniques are of major importance because they can be used to produce high-quality thin films for applications in device technology. This introduction to the subject contains sufficient details of the foundations of plasma science to be useful to newcomers to the field and, at the same time, ample information about specific techniques and new results, so that established researchers will also find it of interest.

Texte du rabat

This book describes the technology and applications of thin-film deposition by plasma techniques. The properties of thin films depend strongly on the deposition technique and the conditions that are used, with films produced by plasma techniques being superior to those produced by traditional methods in many ways. Plasma techniques have already been applied in the manufacture of semiconductors and electronic components, and the range of applications is expanding rapidly. The first half of this book deals with the foundations of plasma science, while the second half treats specific techniques: sputter deposition, ion plating, plasma enhanced chemical vapor deposition, plasma polymerization and plasma surface treatments. This text is an introduction to the subject but also includes details of the latest techniques and new results.

Contenu

1. The Plasma State.- 1.1 Characterization of Plasma.- 1.2 Classification of Plasma.- 2. Reactions in Plasmas.- 2.1 Collision Phenomena.- 2.2 Excitation and Ionization.- 2.3 Recombination.- 2.4 Ion-Molecule Reactions and Reactions Involving Negative Ions.- 2.5 Transport Phenomena.- 3. Generation of Cold Plasma.- 3.1 Electrical Breakdown and Starting Voltage.- 3.2 Glow Discharge.- 3.3 High-Frequency Discharge.- 3.4 Microwave Discharge.- 4. Plasma Diagnostics.- 4.1 Optical Spectroscopy.- 4.2 Probes.- 4.3 Particle Measurements.- 4.4 Others.- 5. Cold Plasma and Thin Film Formation.- 5.1 Interactions of Cold Plasma with Solid Surfaces.- 5.2 Application of Cold Plasma to Thin Film Deposition.- 6. Physical Vapor Deposition Under Plasma Conditions.- 6.1 Sputter Deposition.- 6.2 Ion Plating.- 7. Chemical Vapor Deposition Under Plasma Conditions.- 7.1 Plasma-Enhanced Chemical Vapor Deposition.- 7.2 Plasma Polymerization.- 7.3 Other Techniques.- 8. Surface Modification by Cold Plasma.- 8.1 Surface Treatment for Metals and Semiconductors.- 8.2 Modification of Polymer Surfaces.- References.- Further Reading.