Fundamental Electron Interactions with Plasma Processing Gases

This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

Texte du rabat

This volume deals with the basic knowledge and understanding of the fundamental interactions of low-energy electrons with molecules. Recent advances in electron-molecule interaction processes are discussed and a unique up-to-date and comprehensive account of the fundamental interactions of low-energy electrons with molecules of current interest in modern technology, specially the semiconductor industry, is presented. The material provided in this volume will aid scientists and engineers working in many fields of basic and applied science and engineering. The unique and authoritative knowledge, information, and understanding it provides generically underpins advances in plasma, laser, lighting, discharge, environmental, radiation, and other technologies.

Contenu

1. Fundamental Electron-Molecule Interactions and their Technological Significance.- 1 Introduction.- 2 Low Energy Electron-Molecule Interaction Processes.- 3 Significance of Electron-Molecule Interactions in Plasma Processing.- 4 The Present Work.- 5 References.- 2. Electron-Molecule Interactions in the Gas Phase: Cross Sections and Coefficients.- 1 Introduction.- 2 Collision Cross Sections.- 3 Coefficients and Rate Constants.- 4 Boltzmann-Code-Generated Collision Cross-Section Sets.- 5 References.- 3. Synthesis and Assessment of Electron Collision Data.- 1 Introduction.- 2 Synthesis, Assessment, and Recommendation of Data.- 3 Deduction of Unavailable Data and Understanding from Assessed Data, New Measurements, and Data Needs.- 4 Dissemination and Updating of the Database.- 5 References.- 4. Electron Interactions with CF4, C2F6, AND C3F8.- 1 Introduction.- 2 Electron Interactions with CF4.- 3 Electron Interactions with C2F6.- 4 Electron Interactions with C3F8.- 5 References.- 5. Electron Interactions with CHF3, CF3I, AND c-C4F8.- 1 Introduction.- 2 Electron Interactions with CHF3.- 3 Electron Interactions with CF3I.- 4 Electron Interactions with c-C4F8.- 5 References.- 6. Electron Interactions with Cl2, CCl2F2, BCl3, AND SF6.- 1 Introduction.- 2 Electron Interactions with Cl2.- 3 Electron Interactions with CCl2F2.- 4 Electron Interactions with BCl3.- 5 Electron Interactions with SF6.- 6 References.