FIB Nanostructures

This book offers comprehensive coverage of novel nanostructures fabricated by focused ion beam. It reviews a range of methods, including milling, etching, deposition, and implantation, applied to manipulate structures at the nanoscale.

FIB Nanostructures reviews a range of methods, including milling, etching, deposition, and implantation, applied to manipulate structures at the nanoscale. Focused Ion Beam (FIB) is an important tool for manipulating the structure of materials at the nanoscale, and substantially extends the range of possible applications of nanofabrication. FIB techniques are widely used in the semiconductor industry and in materials research for deposition and ablation, including the fabrication of nanostructures such as nanowires, nanotubes, nanoneedles, graphene sheets, quantum dots, etc. The main objective of this book is to create a platform for knowledge sharing and dissemination of the latest advances in novel areas of FIB for nanostructures and related materials and devices, and to provide a comprehensive introduction to the field and directions for further research. Chapters written by leading scientists throughout the world create a fundamental bridge between focused ion beam and nanotechnology that is intended to stimulate readers' interest in developing new types of nanostructures for application to semiconductor technology. These applications are increasingly important for the future development of materials science, energy technology, and electronic devices. The book can be recommended for physics, electrical engineering, and materials science departments as a reference on materials science and device design.

Texte du rabat

FIB Nanostructures reviews a range of methods, including milling, etching, deposition, and implantation, applied to manipulate structures at the nanoscale. Focused Ion Beam (FIB) is an important tool for manipulating the structure of materials at the nanoscale, and substantially extends the range of possible applications of nanofabrication. FIB techniques are widely used in the semiconductor industry and in materials research for deposition and ablation, including the fabrication of nanostructures such as nanowires, nanotubes, nanoneedles, graphene sheets, quantum dots, etc. The main objective of this book is to create a platform for knowledge sharing and dissemination of the latest advances in novel areas of FIB for nanostructures and related materials and devices, and to provide a comprehensive introduction to the field and directions for further research. Chapters written by leading scientists throughout the world create a fundamental bridge between focused ion beam and nanotechnology that is intended to stimulate readers' interest in developing new types of nanostructures for application to semiconductor technology. These applications are increasingly important for the future development of materials science, energy technology, and electronic devices. The book can be recommended for physics, electric engineering, and materials science departments as a reference on materials science and device design.

• Offers comprehensive coverage of novel nanostructures fabricated by focused ion beam
• Provides the keys to understanding the emerging area of FIB nanostructures
• Written by leading experts in each research area
• Describes a key enabling technology forming a bridge between materials science research and the development of energy-related and other electronicdevices

Contenu

Preface.- Chapter 1: Focused Ion Beam (FIB) technology for micro and nanoscale fabrications.- Chapter 2: Epitaxial ferroelectric nanostructures fabricated by FIB milling.- Chapter 3: Low current focused-ion-beam milling for freestanding nanomaterial characterization.- Chapter 4: Focused ion beam milling of carbon nanotube yarns and Bucky-papers: Correlating their internal structure with their macro-properties.- Chapter 5: Nanoscale electrical contacts grown by Focused-Ion-Beam (FIB) Induced Deposition.- Chapter 6: Metal induced crystallization of focused ion beam induced deposition for functional patterned ultrathin nanocarbon.- Chapter 7: Deterministic Fabrication of Micro- and Nano-Structures by Focused Ion Beam.- Chapter 8: Application of ion beam processes to scanning probe microscopy.- Chapter 9: Fabrication of needle-shaped specimens containing sub-surface nanostructures for Electron Tomography.- Chapter 10: Fabrication technique of deformation carriers (gratings and speckle patterns) with FIB for micro/nano-scale deformation measurement.- Chapter 11: Controlled Quantum Dot Formation on Focused Ion Beam patterned GaAs Substrates.- Chapter 12: Development of Functional Metallic Glassy Materials by FIB and Nano-imprint Technologies.- Chapter 13: Nanostructured Materials Driven by Dielectrophoresis on Nanoelectrods Patterned by Focused Ion Beam.- Chapter 14: Focused Ion Beam Assisted Nano-Scale Processing and Thermoelectrical Characterization.- Chapter 15: FIB design for Nanofluidic applications.- Chapter 16: FIB Patterning of Stainless Steel for the Development of Nano-Structured Stent Surfaces for Cardiovascular Applications.- Chapter 17: Evaluation of damages induced by Ga + focused ion beam in piezoelectric nanostructures.- Chapter 18: Instabilities in Focused Ion Beam-patterned nanostructures.- Chapter 19: Nanostructures by mass-separated FIB.- Index.